Nanolithography and Surface Microscopy with Electron Beams: Volume 231 (Advances in Imaging and Electron Physics #231) (Hardcover)

Nanolithography and Surface Microscopy with Electron Beams: Volume 231 (Advances in Imaging and Electron Physics #231) By Peter W. Hawkes (Editor), Martin Hÿtch (Editor) Cover Image
By Peter W. Hawkes (Editor), Martin Hÿtch (Editor)
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This is book number 231 in the Advances in Imaging and Electron Physics series.

Description


Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.


Product Details
ISBN: 9780443314629
ISBN-10: 0443314624
Publisher: Academic Press
Publication Date: August 1st, 2024
Pages: 232
Language: English
Series: Advances in Imaging and Electron Physics